487,90 лв.

EUV Sources for Lithography

487,90 лв.
An authoritative reference book on EUV source technology. Topics range from an overview of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of DPP and LPP designs and other technologies for producing EUV radiation.
Информация за "EUV Sources for Lithography"
  • SKU 9780819458452
  • Weight 2.088000
  • ISBN 9780819458452
  • Вид корица Hardback
  • Издателство SPIE Press
  • Брой страници 900